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Dimethyl phosphite
1,1,1,3,3,3-hexamethyl-disilazane
dimethyl trimethylsilyl phosphite
Conditions | Yield |
---|---|
at 90℃; for 2h; | 89% |
Conditions | Yield |
---|---|
Stage #1: Dimethyl phosphite With triethylamine In dichloromethane at 0℃; Inert atmosphere; Stage #2: chloro-trimethyl-silane In dichloromethane at 0℃; for 0.5h; Inert atmosphere; | 75% |
With triethylamine In dichloromethane at 0℃; Inert atmosphere; |
chloro-trimethyl-silane
Dimethyl phosphite
A
dimethyl trimethylsilyl phosphite
Conditions | Yield |
---|---|
With triethylamine In dichloromethane at 0℃; for 0.5h; Inert atmosphere; | A 75% B n/a |
chloro-trimethyl-silane
methyl phosphite
dimethyl trimethylsilyl phosphite
Conditions | Yield |
---|---|
With 1,1,1,3,3,3-hexamethyl-disilazane In hexane for 1h; Heating; | 67% |
With triethylamine In benzene | |
With sodium 1.) ether, 2.) ether, RT, 1.5 h; Yield given. Multistep reaction; | |
With triethylamine In dichloromethane at 0℃; | |
With triethylamine In dichloromethane at 0℃; for 1h; |
O,O-dimethyl dithiophosphoric acid S-trimethylsilyl ester
phosphorous acid trimethyl ester
A
dimethyl S-methyl phosphorodithioate
B
dimethyl trimethylsilyl phosphite
Conditions | Yield |
---|---|
In diethyl ether Yield given; |
trimethylsilyl bromide
phosphorous acid trimethyl ester
dimethyl trimethylsilyl phosphite
Conditions | Yield |
---|---|
In dichloromethane for 1.25h; |
dimethyl trimethylsilyl phosphite
triethylamine
Conditions | Yield |
---|---|
Stage #1: dimethyl trimethylsilyl phosphite With borane-THF In tetrahydrofuran Stage #2: triethylamine In methanol | 100% |
dimethyl trimethylsilyl phosphite
acetophenone
(1-phenyl-1-trimethylsilanyloxy-ethyl)-phosphonic acid dimethyl ester
Conditions | Yield |
---|---|
With C4H9O(1-)*C13H27KO6(1+) In tetrahydrofuran at 0℃; for 0.25h; Inert atmosphere; | 99% |
Conditions | Yield |
---|---|
With diethyl ether; lithium perchlorate at 20℃; for 0.25h; | 99% |
1-(thiophen-3-yl)-ethanone
dimethyl trimethylsilyl phosphite
(1-thiophen-3-yl-1-trimethylsilanyloxy-ethyl)-phosphonic acid dimethyl ester
Conditions | Yield |
---|---|
With C4H9O(1-)*C13H27KO6(1+) In tetrahydrofuran at 0℃; for 1h; Inert atmosphere; | 99% |
The Phosphorous acid,dimethyl trimethylsilyl ester, with CAS registry number of 36198-87-5, is also known as Trimethylsilyl dimethyl phosphite. It belongs to categories of Organic Building Blocks; Organic Phosphates/Phosphites; Phosphorus Compounds. Its IUPAC name is didecyl phenyl phosphite.
Physical properties about this chemical are: (1) ACD/LogP: 3.51; (2) # of Rule of 5 Violations: 0; (3) ACD/LogD (pH 5.5): 3.51; (4) ACD/LogD (pH 7.4): 3.51; (5) ACD/BCF (pH 5.5): 272.26; (6) ACD/BCF (pH 7.4): 272.26; (7) ACD/KOC (pH 5.5): 1925.59; (8) ACD/KOC (pH 7.4): 1925.59; (9) # H bond acceptors: 3; (10) # H bond donors: 0; (11) # Freely Rotating Bonds: 4; (12) Polar Surface Area: 41.28 Å2; (13) Flash Point: 38.9 °C; (14) Enthalpy of Vaporization: 36.78 kJ/mol; (15) Boiling Point: 146.6 °C at 760 mmHg; (16) Vapour Pressure: 5.82 mmHg at 25°C.
Preparation of Phosphorous acid,dimethyl trimethylsilyl ester: it is prepared by reaction of chloro-trimethyl-silane with phosphonic acid dimethyl ester. The reaction needs reagent hexamethyldisilazane and solvent hexane as well as other condition of heating for 1 hour. The yield is about 67%.
Uses of Phosphorous acid,dimethyl trimethylsilyl ester: It is used to produce other chemicals. For example, it can produce Dimethyl-1-oxononanphosphonat. It reacts with nonanoyl chloride at the temperature of 50 °C for 30 min. The yield is 69.8%.
When you are using this chemical, please be cautious about it as the following:
As a chemical, it is corrosive, and may destroy living tissue on contact. Meanwhile, it is flammable and may causes burns. In case of contact with eyes, rinse immediately with plenty of water and seek medical advice. Please wear suitable protective clothing, gloves and eye/face protection. In case of accident or if you feel unwell seek medical advice immediately (show the label where possible).
You can still convert the following datas into molecular structure:
(1)SMILES: O(P(OC)O[Si](C)(C)C
(2)InChI: InChI=1/C5H15O3PSi/c1-6-9(7-2)8-10(3,4)5/h1-5H3
(3)InChIKey: HWMXPTIFAGBDIK-UHFFFAOYAC