- Platinum- and palladium-catalysed Kocheshkov redistribution of dialkyltin dichlorides or tetraalkyltins with tin tetrachloride
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The Kocheshkov redistribution reaction of tetraalkyltin or dialkyltin dichlorides with tin tetrachloride is effectively catalysed by platinum(II) or palladium(II) phosphine complexes, yielding alkyltin trichlorides in high yield and with high selectivity.
- Thoonen,Deelman,Van Koten
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- SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION
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A semiconductor photoresist composition includes an organometallic compound represented by Chemical Formula 1, a photoacid generator (PAG), and a solvent: In Chemical Formula 1, R is a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C3 to C20 cycloalkyl group, a substituted or unsubstituted C2 to C20 aliphatic unsaturated organic group including at least one double bond or triple bond, a substituted or unsubstituted C6 to C30 aryl group, an ethoxy group, a propoxy group, or a combination thereof; and X, Y, and Z are each independently —OR1 or —OC(═O)R2.
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Paragraph 0153
(2021/10/11)
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- SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION
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A semiconductor photoresist composition includes an organometallic compound represented by Chemical Formula 1, an organic acid having a vapor pressure of less than or equal to about 1.0 mmHg at 25° C., and a pKa of about 3 to about 5, and a solvent. A method of forming photoresist patterns utilizes the composition.
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Paragraph 0145
(2021/11/20)
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- SEMICONDUCTOR RESIST COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION
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This disclosure relates to a semiconductor resist composition including an organometallic compound represented by Chemical Formula 1 and a solvent, and to a method of forming patterns using the composition: wherein, in Chemical Formula 1, R1 is an aliphatic hydrocarbon group, an aromatic hydrocarbon group, or an -alkylene-O-alkyl group, and R2 to R4 are each independently selected from —ORa and —OC(═O)Rb.
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Paragraph 0103
(2020/05/02)
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- SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION
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A semiconductor photoresist composition includes an organometallic compound represented by Chemical Formula 1, an organometallic compound represented by Chemical Formula 2, and a solvent, and a method of forming patterns using the same. When the semiconductor photoresist composition is irradiated with e.g., extreme ultraviolet light, radical crosslinking between Sn-containing units may occur via Sn—O—Sn bond formation, and a photoresist polymer providing excellent sensitivity, small or reduced line edge roughness, and/or excellent resolution may be formed.
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Paragraph 0132
(2020/12/01)
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- Preparation method of monobutyltin oxide
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The invention provides a preparation method of monobutyltin oxide. The method includes the steps of firstly, adding tetrabutyl tin into a reactor, evenly stirring, slowly dropwise adding tin tetrachloride, then stirring for 30 minutes, heating to 140 DEG C, and performing heat-preservation reaction for 4-8 hours to obtain the mixed solution of monobutyltin trichloride and dibutyltin dichloride; secondly, heating the mixed solution of the monobutyltin trichloride and the dibutyltin dichloride to 95-100 DEG C, and collecting the monobutyltin trichloride; thirdly, adding the monobutyltin trichloride collected in the second step, surfactant and an organic solvent into a reactor, evenly stirring, slowly dropwise adding a sodium hydroxide solution, then heating to 90 DEG C, performing heat-preservation reaction for 3.5-4 hours, cooling to room temperature, filtering to obtain crude monobutyltin oxide, washing the crude monobutyltin oxide until the crude monobutyltin oxide is neutral, and performing reduced-pressure drying at 80 DEG C for 12 hours to obtain the monobutyltin oxide, wherein the surfactant is chitosan modified imidazoline ampholytic surfactant and quaternized polyvinyl alcohol.
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Paragraph 0068; 0070; 0071; 0085-0155
(2017/08/29)
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- Indium-mediated regioselective synthesis of ketones from arylstannanes under solvent-free ultrasound irradiation
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The solvent-free indium-promoted reaction of alkanoyl chlorides with sterically and electronically diverse arylstannanes is a simple and direct method for the regioselective synthesis of primary, secondary and tertiary alkyl aryl ketones in good to excellent isolated yields (42-84%) under mild and neutral conditions. The protocol is also adequate for the synthesis of aryl vinyl ketones. Reaction times are drastically reduced (from 3-32 h to 10-70 min) under ultrasonic irradiation. Evidences for the involvement of a homolytic aromatic ipso-substitution mechanism, in which indium metal acts as radical initiator, are presented. It is possible the transference of two aryl groups from tin, thus improving effective mass yield, working with diarylstannanes as starting substrates.
- Lo Fiego, Marcos J.,Badajoz, Mercedes A.,Domini, Claudia,Chopa, Alicia B.,Lockhart, María T.
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p. 826 - 832
(2013/03/14)
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- Process for the production of monoalkyltin trihalides
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The present invention is directed to a process for the production of monoalkyltin trihalides of the formula RSnX3, wherein R="alkyl or cycloalkyl and" X = Cl, Br or I, involving a redistribution reaction between tetraorganotins, triorganotin halides or diorganotin halides and tin tetrahalides, said process comprising contacting tetra- (R4Sn), tri- (R3SnX) or diorganotin halides (R2SnX2) with SnX4 to afford said monoorganotin trihalides in the presence of at least one transition metal complex, said complex comprising at least one transition metal, M, selected from Group VIII of the periodic Table of elements, at least one monodentate ligand or bidentate ligand, L, L' or L", and optionally one or more anions, X, of an organic or inorganic acid, as a catalyst or catalyst precursor.
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- Horticultural composition and method for controlling plant mites
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An agricultural or horticultural miticidal composition for controlling mites which cause damage to plants, said miticidal composition comprising (1) a liquid carrier and/or a solid carrier, and (2) as an active ingredient, a trialkyltin compound of the formula STR1 wherein R1 represents a linear alkyl group having 6 to 11 carbon atoms, R2 represents a hydrogen atom or a methyl group, the total number of carbon atoms of R1 and R2 is from 7 to 11, m is an integer of 1 or 2, and X represents a chlorine atom, a bromine atom, a fluorine atom, a hydroxyl group, an acyloxy group, a dithiocarbamate group or a group of the formula --SR3, in which R3 represents an alkyl group having 1 to 12 carbon atoms or an aryl group, when m is 1, and a member selected from the class consisting of an oxygen atom, a sulfur atom and a sulfuric acid group when m is 2; and a method for controlling mites using the same.
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- Method for producing monoalkyl-tin-trihalides
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Monoalkyl-tin-trihalides are prepared in a high yield by a method in which a stannous halide reacts with an alkyl halide in an organic solvent in the presence of a catalytic substance selected from the group consisting of magnesium, iodine, bromine, Grignard reagents and a mixture of two or more of the above-mentioned substances, the organic material being selected from liquid alcohols, tetrahydrofuran, liquid organic acids, liquid esters of organic acids, liquid ketones, liquid hydrocarbons and mixtures of two or more of the above-mentioned compounds, and the resultant monoalkyl-tin-trihalide is isolated from the reaction mixture.
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