3584-23-4

Basic information

• Product Name: 2-(4-Methoxyphenyl)-4,6-bis(trichloromethyl)-1,3,5-triazine
• Synonyms: 2-(4-METHOXYPHENYL)-4,6-BIS(TRICHLOROMETHYL)-1,3,5-TRIAZINE;2-(P-METHOXYPHENYL)-4,6-BIS(TRICHLOROMETHYL)-1,3,5-TRIAZINE;4,6-BIS(TRICHLOROMETHYL)-2-(4-METHOXYPHENYL)-1,3,5-TRIAZINE;3,6-Triazine,2-(4-methoxyphenyl)-4,6-bis(trichloromethyl)-1;methoxyphenylbistrichloromethyltriazine;2-(4-Methoxyphenyl)-4,6-Bis(Tr;1,3,5-Triazine, 2-(4-methoxyphenyl)-4,6-bis(trichloromethyl)-;2-(4-METHOXYPHENYL)-4,6-BIS(TRICHLOROMETHYL)-1,3,5-TRIAZINE 98+%
• CAS NO: 3584-23-4
• Molecular Formula: C₁₂H₇Cl₆N₃O
• Molecular Weight: 421.92
• EINECS: 222-711-7
• Product Categories: Heterocycle;Functional Materials;Photopolymerization Initiators
• Mol File: 3584-23-4.mol
• Article Data: 2

Chemical Properties

• Melting Point: 145 °C
• Boiling Point: 462.205 °C at 760 mmHg
• Flash Point: 233.333 °C
• Appearance: /
• Density: 1.616 g/cm³
• Vapor Pressure: 2.78E-08mmHg at 25°C
• Refractive Index: 1.604
• Storage Temp.: Keep in dark place,Sealed in dry,Room Temperature
• Solubility: soluble in Toluene
• PKA: -1.86±0.10(Predicted)
• CAS DataBase Reference: 2-(4-Methoxyphenyl)-4,6-bis(trichloromethyl)-1,3,5-triazine(CAS DataBase Reference)
• NIST Chemistry Reference: 2-(4-Methoxyphenyl)-4,6-bis(trichloromethyl)-1,3,5-triazine(3584-23-4)
• EPA Substance Registry System: 2-(4-Methoxyphenyl)-4,6-bis(trichloromethyl)-1,3,5-triazine(3584-23-4)

Safety Data

• Hazard Codes: Xi
• Hazardous Substances Data: 3584-23-4(Hazardous Substances Data)

Usage

Uses

Used in Holographic Materials:
2-(4-Methoxyphenyl)-4,6-bis(trichloromethyl)-1,3,5-triazine is used as a photopolymer in the production of holographic materials. Its light-sensitive nature allows for the creation of holograms with high resolution and three-dimensional effects, making it an essential component in the holography industry.
Used in Photopolymerizable Compositions:
In the field of photopolymerizable compositions, 2-(4-Methoxyphenyl)-4,6-bis(trichloromethyl)-1,3,5-triazine serves as a key ingredient. Its photopolymerization properties enable the development of materials that can be shaped and formed through exposure to light, offering a wide range of applications in various industries, such as manufacturing, electronics, and art.

InChI:InChI=1/C12H7Cl6N3O/c1-22-7-4-2-6(3-5-7)8-19-9(11(13,14)15)21-10(20-8)12(16,17)18/h2-5H,1H3

Synthetic route

rose bengal (632-69-9) + 2-(4-methoxyphenyl)-4,6-bis(trichloromethyl)-s-triazine (3584-23-4) → C12H7Cl6N3O(1-) + C20H2Cl4I4O5(1-)*2Na(1+) (114601-94-4)

Conditions	Yield
With ethyl p-dimethyaminolbenzoate In acetonitrile Kinetics; Quantum yield; UV-irradiation;

C20H2Cl4I4O5(3-)*2Na(1+) + 2-(4-methoxyphenyl)-4,6-bis(trichloromethyl)-s-triazine (3584-23-4) → C12H7Cl6N3O(1-) + rose bengal (632-69-9)

Conditions	Yield
In acetonitrile Kinetics; Quantum yield;

Downstream Products

• 632-69-9 rose bengal 
• 114601-94-4 C₂₀H₂Cl₄I₄O₅^(1-)*2Na⁽¹⁺⁾ 

Relevant articles and documents

POLYMERIZABLE COMPOUND, POLYMERIZABLE COMPOSITION, POLYMER, AND OPTICALLY ANISOTROPIC BODY

The present invention provides a polymerizable compound represented by the following formula (I), a polymerizable composition that includes the polymerizable compound and an initiator, a polymer obtained by polymerizing the polymerizable compound or the polymerizable composition, and an optically anisotropic article that includes the polymer. The invention makes it possible to provide a polymerizable compound, a polymerizable composition, and a polymer that have a practical low melting point, exhibit an excellent solubility in a general-purpose solvent, can be produced at low cost, and may produce an optical film that achieves uniform conversion of polarized light over a wide wavelength band, and an optically anisotropic article. [In formula: Q1 to Q4 represent hydrogen atoms or the like; X represents a C6-C12 divalent aromatic group or the like; Ax and Ay represent groups represented by the following formula (II); n represents 0 or 1; * represents a bonding position; Y1 to Y6 represent a single bond, -O-, -O-C(=O)-, -C(=O)-O- or the like; G1 and G2 represent divalent C1-C20 aliphatic groups or the like; Z1 and Z2 represent C2-C10 alkenyl groups or the like; A1 represents a trivalent aromatic group or the like; and A2 and A3 represent divalent C6-C30 aromatic groups or the like.]

Compounds for use in a positive-working resist composition

Proposed is novel compounds for use in a chemical-sensitization positive-working photoresist composition used in the photolithographic patterning process for the manufacture of fine electronic devices, which is capable of giving, with high photosensitivity to ArF excimer laser beams, a patterned resist layer having an excellently orthogonal cross sectional profile and high resistance against dry etching and exhibiting good adhesion to the substrate surface. While the composition comprises (A) a film-forming resinous ingredient which causes an increase of alkali solubility by interacting with an acid and (B) a radiation-sensitive acid-generating agent, the most characteristic feature of the invention consists in the use of a specific acrylic resin as the component (A), which comprises the monomeric units of a (meth)acrylic acid ester of hydroxy bicyclo?3.1.1!heptanone unsubstituted or substituted by an alkyl group such as hydroxypinanone (meth)acrylate, optionally, in combination with the monomeric units derived from (meth)acrylic acid and/or tert-butyl (meth)acrylate in a molar fraction of 3:7 to 7:3.