14764-54-6

Basic information

• Product Name: triacetoxybutylstannane
• Synonyms: triacetoxybutylstannane;EINECS 238-828-1;Tris(acetyloxy)butylstannane;Tris(acetyloxy)butyltin(IV)
• CAS NO: 14764-54-6
• Molecular Formula: C₁₀H₁₈O₆Sn
• Molecular Weight: 352.95632
• EINECS: 238-828-1
• Mol File: 14764-54-6.mol
• Article Data: 6

Chemical Properties

• Boiling Point: °Cat760mmHg
• Flash Point: °C
• Appearance: /
• Density: g/cm³
• CAS DataBase Reference: triacetoxybutylstannane(CAS DataBase Reference)
• NIST Chemistry Reference: triacetoxybutylstannane(14764-54-6)
• EPA Substance Registry System: triacetoxybutylstannane(14764-54-6)

Safety Data

• Hazardous Substances Data: 14764-54-6(Hazardous Substances Data)

Usage

InChI:InChI=1/C4H9.3C2H4O2.Sn/c1-3-4-2;3*1-2(3)4;/h1,3-4H2,2H3;3*1H3,(H,3,4);/rC4H9Sn.3C2H4O2/c1-2-3-4-5;3*1-2(3)4/h2-4H2,1H3;3*1H3,(H,3,4)

Upstream product

• 1118-46-3 Trichlorbutylstannan 
• 64-19-7 acetic acid 
• 108-24-7 acetic anhydride 
• 34833-46-0 1,1,3,3-tetra-n-butyl-1,3-di(n-butyloxy)-distanoxane 
• 660402-29-9 1,1,3,3-tetrabutyl-1,3-bis(3-methylbutyloxy)distannoxane 
• 819792-10-4 1,1,3,3-tetrabutyl-1,3-bis(2-ethylbutyloxy)distannoxane 
• 2847-57-6 butyltriphenyltin 

Downstream Products

• 1067-33-0 dibutyltin diacetate 

Relevant articles and documents

SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION

A semiconductor photoresist composition includes an organometallic compound represented by Chemical Formula 1, a photoacid generator (PAG), and a solvent: In Chemical Formula 1, R is a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C3 to C20 cycloalkyl group, a substituted or unsubstituted C2 to C20 aliphatic unsaturated organic group including at least one double bond or triple bond, a substituted or unsubstituted C6 to C30 aryl group, an ethoxy group, a propoxy group, or a combination thereof; and X, Y, and Z are each independently —OR1 or —OC(═O)R2.

SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION

A semiconductor photoresist composition includes an organometallic compound represented by Chemical Formula 1, an organometallic compound represented by Chemical Formula 2, and a solvent, and a method of forming patterns using the same. When the semiconductor photoresist composition is irradiated with e.g., extreme ultraviolet light, radical crosslinking between Sn-containing units may occur via Sn—O—Sn bond formation, and a photoresist polymer providing excellent sensitivity, small or reduced line edge roughness, and/or excellent resolution may be formed.

Process for Production of Alkyl Tin Alkoxide Compound, and Process for Production of Carbonic Acid Ester Using the Compound

The present invention provides a process for producing: a compound represented by XOR2; a dialkyl tin dialkoxide compound having one tin atom, two Sn—R1 bonds and two Sn—OR2 bonds; and/or a tetraalkyl dialkoxy distannoxane compound having one Sn—O—Sn bond, in which each tin atom of the tetraalkyl dialkoxy distannoxane compound has two Sn—R1 bonds and one Sn—OR2 bond, the process comprising reacting in the absence of a catalyst at least one alkyl tin compound selected from the group consisting of i) and ii) below: i) a dialkyl tin compound having one tin atom, two Sn—R1 (wherein R1 represents an alkyl group) bonds, and two Sn—OX bonds (wherein OX is a group in which HOX that is a conjugate acid of OX is a Bronsted acid having a pKa of from 0 to 6.8); andii) a tetraalkyl distannoxane compound having one Sn—O—Sn bond, in which each tin atom of the tetraalkyl distannoxane compound has two Sn—R1 bonds and one Sn—OX bond (wherein OX is a group in which HOX that is a conjugate acid of OX is a Bronsted acid having a pKa of from 0 to 6.8); anda carbonic acid ester represented by R2OCOOR2 (wherein R2 represents a linear or branched, saturated or unsaturated hydrocarbon group, a hydrocarbon group having a saturated or unsaturated cyclic hydrocarbon substituent, or a Y—CH2— group (wherein Y represents an alkyl polyalkylene group, an aromatic group or a cyclic saturated or unsaturated alkylene ether group)), and/oran alcohol represented by R2OH (wherein R2 is the same as defined above).