104109-22-0Relevant articles and documents
Synthesis and characterization of silicon-containing block copolymers from nitroxide-mediated living free radical polymerization
Fukukawa, Ken-Ichi,Zhu, Lei,Gopalan, Padma,Ueda, Mitsuru,Yang, Shu
, p. 263 - 270 (2005)
High etch resistance to oxygen plasma for silicon-containing polymers, and the high thermal and mechanical robustness of the etching product, silicon oxide, make it attractive to design novel silicon-containing block copolymers for direct patterning of na
