10049-17-9

Basic information

• Product Name: RHENIUM HEXAFLUORIDE
• Synonyms: (oc-6-11)-rheniumfluoride(ref6;ReF6;Rhenium fluoride (ReF6), (OC-6-11)-;RHENIUM(VI) FLUORIDE;RHENIUM HEXAFLUORIDE;RHENIUM FLUORIDE;Rheniumfluoride1;Rhenium hexafluoride 99%
• CAS NO: 10049-17-9
• Molecular Formula: F₆Re
• Molecular Weight: 300.2
• EINECS: 233-172-2
• Mol File: 10049-17-9.mol
• Article Data: 5

Chemical Properties

• Melting Point: 18.8 °C(lit.)
• Boiling Point: 47.6 °C(lit.)
• Appearance: /yellow liquid or cubic crystals
• Density: 6 g/mL at 25 °C(lit.)
• Vapor Pressure: 545 mm Hg ( 25 °C)
• Water Solubility: soluble HNO3; soluble 1.75mol/1000g anhydrous HF [MER06]
• CAS DataBase Reference: RHENIUM HEXAFLUORIDE(CAS DataBase Reference)
• NIST Chemistry Reference: RHENIUM HEXAFLUORIDE(10049-17-9)
• EPA Substance Registry System: RHENIUM HEXAFLUORIDE(10049-17-9)

Safety Data

• Hazard Codes: C
• Statements: 14-32-35
• Safety Statements: 53-9-23-30-36/37/39-43-45
• RIDADR: UN 3390 6.1/PG 1
• WGK Germany: 3
• HazardClass: 5.1
• PackingGroup: II
• Hazardous Substances Data: 10049-17-9(Hazardous Substances Data)

Usage

Description

RHENIUM HEXAFLUORIDE is a yellow crystalline compound that is extremely hygroscopic and gives off bluish vapors when exposed to air. It has a transition point of either -1.9 or -3.45°C and exhibits various enthalpy and entropy values for sublimation, fusion, and vaporization. RHENIUM HEXAFLUORIDE can be synthesized by reacting rhenium powder with fluorine gas at approximately 100°C.

Uses

Used in Chemical Vapor Deposition (CVD) Industry:
RHENIUM HEXAFLUORIDE is used as a precursor in the chemical vapor deposition process for the formation of thin films of rhenium. This application is particularly useful in the electronics and semiconductor industries, where precise control of film thickness and composition is required for the fabrication of advanced electronic devices.
Used in Electronics and Semiconductor Industry:
RHENIUM HEXAFLUORIDE is used as a material for the production of thin films in the electronics and semiconductor industry. The compound's properties, such as its enthalpy of sublimation and vaporization, make it suitable for depositing rhenium layers on various substrates, which can be utilized in the manufacturing of electronic components and devices.

InChI:InChI=1/6FH.Re/h6*1H;/q;;;;;;+6/p-6/rF6Re/c1-7(2,3,4,5)6

Synthetic route

rhenium + chlorine trifluoride (7790-91-2) → rhenium hexafluoride (10049-17-9) + rhenium(IV) fluoride (15192-42-4)

Conditions	Yield
In hydrogen fluoride uncomplete reaction at -78°C or under reflux;; ReF4 or ReF6 in soln. obtained;;
In hydrogen fluoride HF (liquid); uncomplete reaction at -78°C or under reflux;; ReF4 or ReF6 in soln. obtained;;

rhenium + chlorine trifluoride (7790-91-2) → rhenium hexafluoride (10049-17-9)

Conditions	Yield
In neat (no solvent) at 300°C;;

rhenium + fluorine (7782-41-4) → rhenium hexafluoride (10049-17-9)

Conditions	Yield
In neat (no solvent) F2 and powdered Re at about 125°C;;
In neat (no solvent) heating Re in fluorspar boat with Cl2-free F2 in fluorspar tube/copper tube to 125 °C for 1/2 h at reduced pressure, exclusion of O2 and moisture;; condensing vapour in quartz trap at -60 °C, ReOCl4-free, pure product;;
In neat (no solvent) heating Re in fluorspar boat with F2 in fluorspar tube to 125 °C for 1/2 h, exclusion of O2 and moisture;; condensing vapour in quartz trap at -60 °C, product contg. ReOF4;;

decacarbonyldirhenium(0) (14285-68-8) + xenon fluoride → rhenium hexafluoride (10049-17-9)

Conditions	Yield
With HF In hydrogen fluoride HF (liquid); vac. line; large excess of HF;

rhenium → rhenium hexafluoride (10049-17-9)

Conditions	Yield
With F2 In neat (no solvent) sublimation;

rhenium + fluorine (7782-41-4) → rhenium hexafluoride (10049-17-9) + rhenium heptafluoride (17029-21-9)

Conditions	Yield
In neat (no solvent)	A n/a B 0%
In neat (no solvent)	A n/a B 0%

rhenium heptafluoride (17029-21-9) → rhenium hexafluoride (10049-17-9)

Conditions	Yield
With dichloromethane In dichloromethane byproducts: CH2ClF, CHClF2, CHCl2F; inert atmosphere; excess of CH2Cl2, warming to room temp., 4 h; further byproduct;

rhenium + rhenium oxide pentafluoride (23377-53-9) → rhenium hexafluoride (10049-17-9) + rhenium(VI) oxide fluoride

Conditions	Yield
With H2 In neat (no solvent) anhydrous atmosphere; activation of Re by static hydrogenation (573 K), then heating with ReOF5 (stainless-steel autoclave, 473 K, 16 h); cooling to room temp., removal of volatiles (vac.);

rhenium(IV) oxide + fluorine (7782-41-4) → rhenium hexafluoride (10049-17-9) + rhenium oxide pentafluoride (23377-53-9)

Conditions	Yield
In neat (no solvent) anhydrous conditions, prefluorinated Ni apparatus; 525 K; removal of volatiles (room temp.), vac. sublimation;

decacarbonyldirhenium(0) (14285-68-8) + xenon fluoride → rhenium hexafluoride (10049-17-9) + abcde-pentacarbonyl-f-μ-fluoro-ghijk-pentafluororhenium(I)-rhenium(V)

Conditions	Yield
With HF In hydrogen fluoride byproducts: CO, Xe; HF (liquid); vac. line; addn. of 4-5 molar equiv. of XeF2 to Re-complex; evapn. (vac.); unchanged Re2(CO)10 present in product with molar ratio of educts 1:1 and 1:2;

rhenium hexafluoride (10049-17-9) + octafluoronaphthalene (313-72-4) → octafluoronaphthalene hexafluororhenate(V) (102747-22-8)

Conditions	Yield
In trichlorofluoromethane octafluoronaphthalene dissolved in dry trichlorofluoromethane at 273 K,excess rhenium hexafluoride added; solvent removed;	100%

decacarbonyldirhenium(0) (14285-68-8) + rhenium hexafluoride (10049-17-9) + hydrogen fluoride (7664-39-3) → hexacarbonylrhenium(I) μ-fluoro-bis[pentafluororhenate(V)] (41944-00-7)

Conditions	Yield
In hydrogen fluoride HF (liquid); absence of air and moisture (vac. technique, Kel-F apparatus); condensing HF onto Re-carbonyl, addn. of 4 molar equivalents of ReF6 (by sublimation), slow warming to room temp., standing for several days (crystn.); decantation, drying (vac.); elem. anal.;	86%

rhenium hexafluoride (10049-17-9) + tetramethylorthosilicate (681-84-5) → Re(OCH3)6

Conditions	Yield
byproducts: SiF(OCH3)3; sepn. by sublimation;	80%

rhenium hexafluoride (10049-17-9) + tetramethylorthosilicate (681-84-5) → C10H30O10Re2

Conditions	Yield
With Mg(OMe)2(HOMe)2 In tetrahydrofuran; acetonitrile Condensating ReF6 into an acetonitrile soln. of Si(OMe)4 at -40°C followed by slow warming to room temperature, isolating reaction mixt., reacting with excess Mg(OMe)2(HOMe)2 soln. in THF.;	60%

chlorine trifluoride (7790-91-2) + rhenium hexafluoride (10049-17-9) + trimethylsilylazide (4648-54-8) → ReF5(NCl) (84159-30-8) + rhenium tetrafluoride nitride (84159-29-5)

Conditions	Yield
In 1,1,2-Trichloro-1,2,2-trifluoroethane ReF6 was reacted with ligand at -50°C in CF3ClCFCl2, allowed to warm to 0°C, solvent was removed, residue was warmed to 70°C in vac., sublimed, involatile residue was reacted with ClF3 at 0°C; sublimed at 70°C in vac.;	A n/a B 10%

rhenium hexafluoride (10049-17-9) + hydrogen fluoride (7664-39-3) + water (7732-18-5) → rhenium(VI) oxide fluoride

Conditions	Yield
In hydrogen fluoride room temp., equimolar amts. of ReF6 and H2O, removal of HF;

rhenium hexafluoride (10049-17-9) + potassium iodide (7681-11-0) → iodine (7553-56-2)

Conditions	Yield
In neat (no solvent) reaction below 0 °C;;

rhenium hexafluoride (10049-17-9) + zinc(II) oxide → zinc(II) fluoride + rhenium(VI) oxide fluoride

Conditions	Yield
In melt melting ZnO and ReF6 at 300 °C;; product mixt.;;

rhenium hexafluoride (10049-17-9) + hydrogen fluoride (7664-39-3) + boric acid (11113-50-1) → H3O(1+)*Re2O2F9(1-)=H3ORe2O2F9 (108122-10-7) + rhenium oxotetrafluoride (17026-29-8, 52152-11-1)

Conditions	Yield
With H2O In hydrogen fluoride byproducts: BF3; HF (liquid); H3BO3 was dissolved in HF, BF3 was distilled off at -78°C, H2O was dissolved in HF, ReF6 was condensed onto the soln., the mixt. was allowed to warm to room temp.; identified by Raman spectroscopy;

rhenium + rhenium hexafluoride (10049-17-9) → rhenium(IV) fluoride (15192-42-4)

Conditions	Yield
In neat (no solvent) heating to 400-500 °C;;

rhenium hexafluoride (10049-17-9) + hydrogen fluoride (7664-39-3) + silica gel (112926-00-8, 7631-86-9) → rhenium(VII) oxide fluoride (42246-24-2) + rhenium(IV) oxide fluoride

Conditions	Yield
In hydrogen fluoride byproducts: HF; treating a soln. of ReF6 in pure liq. H2F2 with F2 in presence of KF in quartz vessel;; pptn., ReOF2 main product;;
In hydrogen fluoride byproducts: HF; HF (liquid); treating a soln. of ReF6 in pure liq. H2F2 with F2 in presence of KF in quartz vessel;; pptn., ReOF2 main product;;

rhenium hexafluoride (10049-17-9) + 2,3,4,5,6-pentafluoroaniline (771-60-8) → ReF4(NC6F5) (119604-53-4) + C6F5NH3(1+)*F(1-)={C6F5NH3}F

Conditions	Yield
In further solvent(s) solvent: Genetron 113, excess of ReF6, at -80°C, allowed to warm to room temp., allowed to stand overnight at room temp.; not isolated;

rhenium hexafluoride (10049-17-9) + hydrogen (1333-74-0) → rhenium pentafluoride (30937-52-1)

Conditions	Yield
In hydrogen fluoride HF (liquid); large exess of H2 condensed onto hexafluoride in anhydrous HF at -196°C, allowed to warm to room temp.; volatile species removed, fractionated; IR;

rhenium hexafluoride (10049-17-9) → rhenium

Conditions	Yield
With sulfur dioxide In neat (no solvent) heating above 400 °C;;
With carbon monoxide In neat (no solvent) heating above 300 °C;;
With hydrogen In neat (no solvent) heating in H2 above 250 °C;;
With Mg or Zn or Al; In neat (no solvent) redn. at red heat;;

rhenium hexafluoride (10049-17-9) → rhenium(VI) oxide fluoride + rhenium(VII) oxide fluoride (42246-24-2)

Conditions	Yield
With oxygen In neat (no solvent) heating in O2 to 200-300 °C;; product mixt.;;

rhenium hexafluoride (10049-17-9) → rhenium(IV) fluoride (15192-42-4)

Conditions	Yield
With carbon monoxide In neat (no solvent) heating to 300 °C;;
With hydrogen In neat (no solvent) byproducts: H2F2; mixing ReF6-vapour with H2 and O2-free N2, passing through Pt-tube at 200 °C, exclusion of air and moisture;; evapn. of H2F2 and ReF6 in vac.;;
With hydrogen In neat (no solvent) heating in H2 to 200-250 °C;;

rhenium hexafluoride (10049-17-9) → ReO2*2H2O + per-rhenic acid (207984-93-8)

Conditions	Yield
With water In water hydrolysis;

rhenium hexafluoride (10049-17-9) → Re hexafluoride(1-)

Conditions	Yield
In neat (no solvent, gas phase) Kinetics; other Radiation; 133 Pa of He at 297 K;

rhenium hexafluoride (10049-17-9) + molybdenum hexafluoride ion (42847-47-2) → Re hexafluoride(1-)

Conditions	Yield
In neat (no solvent, gas phase) Kinetics; other Radiation; 133 Pa of He at 304 K;

potassium permanganate (7722-64-7) + rhenium hexafluoride (10049-17-9) → rhenium(VI) oxide fluoride + rhenium(VII) oxide fluoride (42246-24-2)

Conditions	Yield
In melt heating melt of KMnO4 and ReF6 at 100 °C;;

rhenium hexafluoride (10049-17-9) + silica gel (112926-00-8, 7631-86-9) → rhenium(IV) fluoride (15192-42-4) + rhenium(VII) oxide fluoride (42246-24-2) + silicon tetrafluoride (7783-61-1)

Conditions	Yield
In neat (no solvent) in presence of moisture or alkali;;

rhenium hexafluoride (10049-17-9) + silica gel (112926-00-8, 7631-86-9) → silicon tetrafluoride (7783-61-1)

Conditions	Yield
In neat (no solvent) above 3o ° C;;

rhenium + rhenium hexafluoride (10049-17-9) → rhenium pentafluoride (30937-52-1)

Conditions	Yield
In gas redn. of ReF6 by Re vapor at 110-1250 K in a mass spectrometer fitted with a Knudsen chamber; not isolated, detected by MS;

Upstream product

• 14285-68-8 decacarbonyldirhenium⁽⁰⁾ 
• 7782-41-4 fluorine 
• 17029-21-9 rhenium heptafluoride 
• 7790-91-2 chlorine trifluoride 
• 23377-53-9 rhenium oxide pentafluoride 

Downstream Products

• 7553-56-2 iodine 
• 7783-56-4 antimony(III) fluoride 
• 7637-07-2 boron trifluoride 
• 7783-61-1 silicon tetrafluoride 
• 15192-42-4 rhenium(IV) fluoride 
• 42246-24-2 rhenium(VII) oxide fluoride 
• 119604-53-4 ReF₄(NC₆F₅) 

Relevant articles and documents

High Oxidation State Binary Transition Metal Fluorides as Selective Fluorinating Agents

High oxidation state transition metal fluorides are selective fluorinating agents for dichloromethane, those with d0 electronic configurations undergo hydrogen-fluorine exchange and metal reduction, while dn species undergo chlorine-

Spectroscopic Studies on the Hexafluorides of Rhenium, Osmium, Iridium, and Platinum isolated in Low-temperature Matrices

The compounds ReF6, OsF6, IrF6, and PtF6 have been isolated as monomeric species in inert-gas matrices at low temperatures, and characterised by i.r. spectroscopy.Subsequent u.v.-visible studies reveal a complex pattern of electronic absorptions, and a detailed assignment of these in terms of charge transfer, d-d, and intra-configurational transitions is presented.