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Tungsten silicide (W5Si3)

Base Information Edit
  • Chemical Name:Tungsten silicide (W5Si3)
  • CAS No.:12039-95-1
  • Deprecated CAS:107069-46-5
  • Molecular Formula:Si3W5
  • Molecular Weight:1003.4565
  • Hs Code.:
  • European Community (EC) Number:234-912-7
  • DSSTox Substance ID:DTXSID50923376
  • Mol file:12039-95-1.mol
Tungsten silicide (W5Si3)

Synonyms:Tungsten silicide (W5Si3);12039-95-1;Pentatungsten trisilicide;EINECS 234-912-7;silicon;tungsten;Si.W;Si3W5;Silane--tungsten (3/5);DTXSID50923376;HXBCHXQSHJCYFO-UHFFFAOYSA-N

Suppliers and Price of Tungsten silicide (W5Si3)
Supply Marketing:Edit
Business phase:
The product has achieved commercial mass production*data from LookChem market partment
Manufacturers and distributors:
  • Manufacture/Brand
  • Chemicals and raw materials
  • Packaging
  • price
Total 5 raw suppliers
Chemical Property of Tungsten silicide (W5Si3) Edit
Chemical Property:
  • Vapor Pressure:54300mmHg at 25°C 
  • Melting Point:2320°C 
  • Boiling Point:°Cat760mmHg 
  • Flash Point:°C 
  • Density:g/cm3 
  • Water Solubility.:insoluble H2O [HAW93] 
  • Hydrogen Bond Donor Count:0
  • Hydrogen Bond Acceptor Count:0
  • Rotatable Bond Count:0
  • Exact Mass:1002.68544
  • Heavy Atom Count:8
  • Complexity:0
Purity/Quality:

98%,99%, *data from raw suppliers

Safty Information:
  • Pictogram(s):  
  • Hazard Codes: 
MSDS Files:
Useful:
  • Chemical Classes:Metals -> Metals, Inorganic Compounds
  • Canonical SMILES:[Si].[Si].[Si].[W].[W].[W].[W].[W]
Technology Process of Tungsten silicide (W5Si3)

There total 1 articles about Tungsten silicide (W5Si3) which guide to synthetic route it. The literature collected by LookChem mainly comes from the sharing of users and the free literature resources found by Internet computing technology. We keep the original model of the professional version of literature to make it easier and faster for users to retrieve and use. At the same time, we analyze and calculate the most feasible synthesis route with the highest yield for your reference as below:

synthetic route:
Guidance literature:
In gas; low-pressure chemical vapor deposition (SiH2Cl2 flow rate 670 sccm, WF6 flow rate 18 sccm, total pressure 0.5 Torr, 530°C); X-ray diffraction, Rutherford backscattering, transmission electron microscopy;
DOI:10.1149/1.2087105
upstream raw materials:

tungsten(VI) fluoride

Dichlorosilane

Refernces Edit
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